- All sections
- C - Chemistry; metallurgy
- C23C - Coating metallic material; coating material with metallic material; surface treatment of metallic material by diffusion into the surface, by chemical conversion or substitution; coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general
- C23C 16/22 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (CVD) processes characterised by the deposition of inorganic material, other than metallic material
Patent holdings for IPC class C23C 16/22
Total number of patents in this class: 402
10-year publication summary
33
|
28
|
24
|
24
|
15
|
14
|
17
|
12
|
11
|
2
|
2015 | 2016 | 2017 | 2018 | 2019 | 2020 | 2021 | 2022 | 2023 | 2024 |
Principal owners for this class
Owner |
All patents
|
This class
|
---|---|---|
Applied Materials, Inc. | 16587 |
37 |
Tokyo Electron Limited | 11599 |
33 |
Lam Research Corporation | 4775 |
25 |
Kokusai Electric Corporation | 1791 |
20 |
ASM IP Holding B.V. | 1715 |
19 |
Novellus Systems, Inc. | 559 |
6 |
Global OLED Technology LLC | 590 |
5 |
Silcotek Corp. | 64 |
5 |
UChicago Argonne, LLC | 866 |
5 |
Versum Materials US, LLC | 591 |
5 |
Hitachi High-Tech Corporation | 4424 |
5 |
Samsung Display Co., Ltd. | 30585 |
4 |
Eastman Kodak Company | 3444 |
4 |
Eugene Technology Co., Ltd. | 171 |
4 |
Jusung Engineering Co., Ltd. | 359 |
4 |
Xr Reserve LLC | 31 |
4 |
Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | 6132 |
4 |
Samsung Electronics Co., Ltd. | 131630 |
3 |
LG Chem, Ltd. | 17205 |
3 |
Micron Technology, Inc. | 24960 |
3 |
Other owners | 204 |